A wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital. Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS.
- Plasma source characterisation
- Etch and deposition process reaction kinetic studies
- Analysis of neutral and radical species
Mass spectrometers for Gas Analysis, Mass spectrometers for Surface Analysis, Mass spectrometers Vacuum Analysis.